Al Damage-Free Insulating Film Etching Solution
Al and Al alloy films are etched well without corroding the insulating film. We have products for etching processing and for removing Si natural oxide films.
The features of this product are as follows: - It does not corrode Al or Al alloys. - It forms a good tapered profile. - It can be used for the formation of vias and pads through wet etching. - It can also be used as a pretreatment solution for Pure Etch 160 (Al damage-free Si etching solution). Keywords: wet etching, SiO2, SiN, TEOS, silicon oxide film, silicon nitride film.
- Company：Hayashi Pure Chemical Ind., Ltd. Electronic Materials
- Price：Other
